IONTOF

IONTOF is a manufacturer of innovative instruments for surface analysis. The company’s products are based on the commercialisation of two analytical techniques: Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and high-sensitivity Low-Energy Ion scattering (LEIS).
Founded as a spin-off of the University of Münster, IONTOF has meanwhile become the technological leader in the field of TOF-SIMS and LEIS instrumentation.
The company was founded by Prof. Alfred Benninghoven, Dr. Ewald Niehuis and Mr. Thomas Heller in 1989 to commercialise the original research carried out by Prof. Benninghoven and his team at the University of Münster in Germany from the early 80’s. Since the technique became commercially viable IONTOF has made many product improvements and more than 350 instruments are in operation in industrial and academic laboratories worldwide.

IONTOF’s product range is focussed on complete turn-key systems for the following techniques:

  • Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) Systems:
    • High-performance instruments for surface analysis, capable of detecting and mapping chemical compositions with high sensitivity and spatial resolution.
    • Suitable for a wide range of applications, including materials science, electronics, and life sciences.
    • The new M6 TOF analyser provides the next level of mass resolution in combination with the Nanoprobe 50 bismuth cluster ion source to guarantee a spatial resolution of 50nm.
  • Combination of TOF SIMS with other instruments
    • Combined TOF-SIMS and Orbitrapâ„¢ mass spectrometry extends the mass resolution and accuracy still further for unambiguous peak detection. Ideal for complex organic and biological sample analysis
    • Combination of TOF-SIMS and SPM: An in situ scanning probe allows the change in surface topography to be accurately characterised during a depth profiling experiment to give accurate depth information for the TOF-SIMS crater as well as measuring the physical properties of the sample.
  • Advanced Low-Energy Ion Scattering (LEIS):
    Utilises low-energy ion scattering to provide unparalleled sensitivity to the outermost atomic layers of a material’s surface. Ideal for studying surface phenomena, such as oxidation, contamination, and surface segregation.
  • Software for Data Analysis:
    • Comprehensive and intuitive software packages for TOF-SIMS data acquisition, visualisation, and interpretation.
    • Tools for generating detailed chemical maps and 3D reconstructions.

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IONTOF M6 TOF-SIMS

The M6 is the latest generation of high-end TOF-SIMS instruments developed by IONTOF. Its design guarantees superior performance in all fields of SIMS applications. Ground-breaking ion beam and mass analyser technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research. The instrument includes:

M6 TOF Analyser: The revolutionary design of the extraction optics, the ion transfer and detection system provides an unmatched level of mass resolution, mass accuracy and transmission.

Nanoprobe 50: The Nanoprobe 50 is the latest generation bismuth cluster ion source for the M6. It provides highest beam currents and ultimate lateral resolutions down to 50 nm, guaranteed.

 

 

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IONTOF M6 Plus: Combining TOF-SIMS and SPM in situ

The tool for nano characterisation
Information regarding the chemical composition, physical properties, and three-dimensional structure of materials and devices at the nanometre scale is crucial for new developments in nanoscience and nanotechnology. In a 3D SIMS measurement, the initial topography of the sample surface, as well as topographic changes during the experiment, cannot be easily identified. Scanning Probe Microscopy (SPM) provides complementary information about the surface topography and can also be used to measure the physical properties of the analysed sample.
Through the combination of these two techniques true in situ three-dimensional chemical imaging becomes possible. The M6 Plus platform combines the high-end performance of the M6 with the possibility to perform in situ SPM measurements. The large area SPM unit has a scan range of up to 80 x 80 x 10 µm3 and is ideally suited to provide topographic information for true 3D SIMS measurements.
Micrometre position accuracy
The piezo sample stage of the M6 Plus with sub-micron position accuracy ensures fast and precise movement between the TOF-SIMS and the SPM measurement position.
The stage has a 10 nm encoder resolution and travel speeds of up to 10 mm/s which guarantees a high level of precision and stability.
True 3D chemical imaging
Some samples have a strong initial surface topography which cannot be identified correctly with TOF-SIMS. By combining the chemical information of TOF-SIMS with the dimensional information of SPM a true three-dimensional chemical image can be generated.
Surface profiler mode
The SPM module of the M6 Plus also allows for detailed analysis of large sputter craters. In the so-called surface profiler mode multiple SPM scans are stitched together to measure long SPM line scans. This unique SPM mode is extremely valuable to precisely determine the depth of sputter craters or to measure crater roughness on the nanometre scale.
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IONTOF M6 Hybrid SIMS

With the OrbitrapTM extension for the M6, IONTOF provides the first commercial SIMS instrument which combines the highest mass resolution (> 240,000) and highest mass accuracy (< 1 ppm) with high resolution cluster SIMS imaging.
The combination of the fast imaging capabilities of the TOF analyser with the unique performance of the OrbitrapTM for unambiguous peak identification provides a new level of SIMS information from organic samples.
The instrument extension also provides field-proven, high-end MS/MS capabilities and sets a benchmark for high resolution molecular SIMS applications.
The powerful combination of the gas cluster ion source and the OrbitrapTM analyser enables the distinction of different features even in highly complex organic samples.
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Qtac Low Energy Ion Scattering (LEIS) System

The Qtac is a high sensitivity Low Energy Ion Scattering (LEIS) instrument. It is extremely surface-sensitive, providing quantitative elemental characterisation of the top atomic layer.

This instrument has been developed to include small spot analysis, surface imaging, and both static and dynamic depth profiling.

Its unique surface sensitivity makes the Qtac the perfect tool to study surface processes. The Qtac provides valuable information in many production and research areas on materials such as catalysts, semiconductors, metals, polymers, and fuel cells.

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