Sample Preparation and Deposition

VSM Instruments offers a range of tools and components for sample preparation and modification. Please click the sub categories below to browse our range

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Sample Preparation and Deposition

VSM Instruments offers a range of tools and components for sample preparation and modification. Please click the sub categories below to browse our range

Key Features


Our products include the following main areas:

  • Ion sources including those for sample cleaning of small samples, focussed sources for depth profiling and broader beam ECR and RF plasma sources
  • Low Energy Electron Diffraction (LEED) to characterise thin films or surface reconstruction of single crystals.
  • Molecular Beam Epitaxy (MBE) complete systems
  • MBE components such as effusion cells
  • MBE sample handling
  • electron beam evaporators

Sample Preparation and Deposition

VSM Instruments offers a range of tools and components for sample preparation and modification. Please click the sub categories below to browse our range

Key Features


Our products include the following main areas:

  • Ion sources including those for sample cleaning of small samples, focussed sources for depth profiling and broader beam ECR and RF plasma sources
  • Low Energy Electron Diffraction (LEED) to characterise thin films or surface reconstruction of single crystals.
  • Molecular Beam Epitaxy (MBE) complete systems
  • MBE components such as effusion cells
  • MBE sample handling
  • electron beam evaporators

We have several ion source options in our product range including a simple robust ion source for sample preparation on small (typically flag-style) samples. Our more advanced IQE12 series sources can also be used for sample cleaning but offer focus and raster capability with depth profiling and ISS (Ion Scattering Spectroscopy) or SIMS (Secondary Ion Mass Spectroscopy) applications in mind (an optional Wien mass filter is available for the latter two applications). A version of IQE12 is available for applications where a beam of low energy ions is needed for charge neutralisation. The sources are based on extractor technology with a yttrium oxide coated iridium filament making them suitable for both reactive and inert gases.

Effusion Cells are used in ultra-high vacuum (UHV) evaporation systems, for example in MBE (Molecular Beam Epitaxy) to generate ultrapure molecular and atomic beams from a large variety of elements and compounds. They are sometimes known as K-Cells or Knudsen Cells. In the product table you can see a range of different cells we can offer to evaporate almost every material. Temperatures range from: -60 °C to 2400 °C

Our range of e-beam evaporators are designed to evaporate low vapour pressure materials. The material is heated in a localised area by an electron beam produced from a filament biased relative to the rod of the desired material or to a crucible containing it. Our smaller sources are typically optimised for highly controlled deposition of very thin layers in the range of a monolayer or a few nm onto smaller flag-style samples. As the sources get larger, material capacity and possible sample size increases accordingly.

The CreaTec MiniMBE System is specially designed for Molecular Beam Epitaxy growth on small, typically flag style, samples in combination with a reduced size of the system compared to typical MBE systems. The system still has space to accommodate up to 11 effusion cells around a larger central port for a plasma source or e-beam evaporator. The small chamber size compared to typical MBE systems has advantages for ease of integration with other systems, less lab floor space and of course lower running costs.

Low Energy Electron Diffraction (LEED) is one of the most powerful methods to determine surface structures. Analysis of LEED patterns and intensities provides the size and shape of the surface unit cell, the degree of order and detailed atomic structure with a precision of the order of picometers. Our LEED optics also enable Auger Electron Spectroscopy (AES) when equipped with the appropriate (optional) control unit. AES is a technique to provide chemical analysis of the surface. Our LEED optics are available in two flange sizes, DN100CF and DN150CF. We recommend the largest possible flange size if the chamber allows it, as larger screen sizes much are easier to work with and the cost saving for the smaller optics is minimal.

CreaTec designs and manufactures complete MBE Systems for the preparation of epitaxial films (semiconductors, metals, dielectrics, organics, etc) and wafers for various scientific applications. All systems are assembled under Class 10 cleanroom conditions. Selected materials and chambers are used to guarantee high quality and reliability. CreaTec provides solutions for all kinds of physical vapor deposition (PVD) applications.

RHEED is a diffraction technique used to analyse the surface of ordered or crystalline materials usually undergoing a process of layer by layer growth such as during MBE (Molecular Beam Epitaxy) or PVD (Physical Vapour Deposition). The technique is well suited to monitoring in-situ deposition because its long working distance and grazing angle does not shadow the sample from the material being deposited. The individual diffraction spots can be monitored and usually exhibit oscillations in intensity as each new layer is formed, the peak of the oscillation represents the maximum degree of order since a new monolayer is complete. Our RHEED guns are available in 3 different version with different primary beam energy and are equipped with a long-life filament. The higher energy version exhibits a slightly better spot profile but the lower energy versions have a price advantage.