Ion Sources
We have several ion source options in our product range including a simple robust ion source for sample preparation on small (typically flag-style) samples. Our more advanced IQE12 series sources can also be used for sample cleaning but offer focus and raster capability with depth profiling and ISS (Ion Scattering Spectroscopy) or SIMS (Secondary Ion Mass Spectroscopy) applications in mind (an optional Wien mass filter is available for the latter two applications). A version of IQE12 is available for applications where a beam of low energy ions is needed for charge neutralisation. The sources are based on extractor technology with a yttrium oxide coated iridium filament making them suitable for both reactive and inert gases.
Key Features
Sources for the following applications are available
- Sample cleaning
- SIMS
- ISS
- Charge neutralisation
For a broader beam and currents in the mA range, please also consider our range of plasma sources configured in ion source mode.
| Part No. | Energy range (eV) | Ion current (uA) | Mounting flange | In vacuum length (mm) | Applications | Focus | XY Deflection | Spot Size | Working distance (mm) | Mass filter | |
|---|---|---|---|---|---|---|---|---|---|---|---|
| SPIQE11/35 | 200-5000 | 20 | DN40CF | 62,120,190,250 optional | Sample cleaning | No | No | 5-20mm | 30-80 | No | |
| SPIQE11/35 | |||||||||||
| SPIQE12/38 | 10-5000 | 0.8-8 dep. spot size | DN40CF | 186 | Depth profiling + cleaning + ISS + SIMS | Yes | Yes | 125-1000 um | 23 | No | |
| SPIQE12/38 | |||||||||||
| SPIQE12/38LE | 200-5000 | 0.8-8 dep. spot size | DN40CF | 186 | Charge compensation + Depth profiling + cleaning + ISS + SIMS | Yes | Yes | 125-1000 um | 23 | No | |
| SPIQE12/38LE | |||||||||||
| SPIQE12/38MF | 200-5000 | 0.8-8 dep. spot size | DN40CF | 186 | ISS + SIMS | Yes | Yes | 125-1000 um | 23 | Yes | |
| SPIQE12/38MF |
