TOF-SIMS

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals.

The M6 is the latest generation of high-end TOF-SIMS instruments developed by VSM Instruments’ partners IONTOF. Its design guarantees superior performance in all fields of SIMS applications. New ground-breaking ion beam and mass analyser technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research.

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TOF-SIMS

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals.

The M6 is the latest generation of high-end TOF-SIMS instruments developed by VSM Instruments’ partners IONTOF. Its design guarantees superior performance in all fields of SIMS applications. New ground-breaking ion beam and mass analyser technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research.

Key Features


  • High lateral resolution (< 50 nm) with the new Nanoprobe 50
  • Mass resolution > 30,000 (> 240,000 in M6 hybrid version with additional OrbitrapTM analyser)
  • Unique delayed extraction mode for high transmission with high lateral and high mass resolution simultaneously
  • Unmatched dynamic range and detection limits
  • TOF MS/MS with CID fragmentation for molecular structure elucidation
  • New flexible, push-button, closed-loop sample heating and cooling system for long-term operation without user interaction
  • Sophisticated SurfaceLab 7 software including fully integrated Multivariate Statistical Analysis (MVSA) software package

TOF-SIMS

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals.

The M6 is the latest generation of high-end TOF-SIMS instruments developed by VSM Instruments’ partners IONTOF. Its design guarantees superior performance in all fields of SIMS applications. New ground-breaking ion beam and mass analyser technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research.

Key Features


  • High lateral resolution (< 50 nm) with the new Nanoprobe 50
  • Mass resolution > 30,000 (> 240,000 in M6 hybrid version with additional OrbitrapTM analyser)
  • Unique delayed extraction mode for high transmission with high lateral and high mass resolution simultaneously
  • Unmatched dynamic range and detection limits
  • TOF MS/MS with CID fragmentation for molecular structure elucidation
  • New flexible, push-button, closed-loop sample heating and cooling system for long-term operation without user interaction
  • Sophisticated SurfaceLab 7 software including fully integrated Multivariate Statistical Analysis (MVSA) software package

IONTOF M6 TOF-SIMS

The M6 is the latest generation of high-end TOF-SIMS instruments developed by IONTOF. Its design guarantees superior performance in all fields of SIMS applications. Ground-breaking ion beam and mass analyser technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research. The instrument includes:

M6 TOF Analyser: The revolutionary design of the extraction optics, the ion transfer and detection system provides an unmatched level of mass resolution, mass accuracy and transmission.

Nanoprobe 50: The Nanoprobe 50 is the latest generation bismuth cluster ion source for the M6. It provides highest beam currents and ultimate lateral resolutions down to 50 nm, guaranteed.

 

 

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IONTOF M6 Hybrid SIMS

With the OrbitrapTM extension for the M6, IONTOF provides the first commercial SIMS instrument which combines the highest mass resolution (> 240,000) and highest mass accuracy (< 1 ppm) with high resolution cluster SIMS imaging.
The combination of the fast imaging capabilities of the TOF analyser with the unique performance of the OrbitrapTM for unambiguous peak identification provides a new level of SIMS information from organic samples.
The instrument extension also provides field-proven, high-end MS/MS capabilities and sets a benchmark for high resolution molecular SIMS applications.
The powerful combination of the gas cluster ion source and the OrbitrapTM analyser enables the distinction of different features even in highly complex organic samples.
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IONTOF M6 Plus: Combining TOF-SIMS and SPM in situ

The tool for nano characterisation
Information regarding the chemical composition, physical properties, and three-dimensional structure of materials and devices at the nanometre scale is crucial for new developments in nanoscience and nanotechnology. In a 3D SIMS measurement, the initial topography of the sample surface, as well as topographic changes during the experiment, cannot be easily identified. Scanning Probe Microscopy (SPM) provides complementary information about the surface topography and can also be used to measure the physical properties of the analysed sample.
Through the combination of these two techniques true in situ three-dimensional chemical imaging becomes possible. The M6 Plus platform combines the high-end performance of the M6 with the possibility to perform in situ SPM measurements. The large area SPM unit has a scan range of up to 80 x 80 x 10 µm3 and is ideally suited to provide topographic information for true 3D SIMS measurements.
Micrometre position accuracy
The piezo sample stage of the M6 Plus with sub-micron position accuracy ensures fast and precise movement between the TOF-SIMS and the SPM measurement position.
The stage has a 10 nm encoder resolution and travel speeds of up to 10 mm/s which guarantees a high level of precision and stability.
True 3D chemical imaging
Some samples have a strong initial surface topography which cannot be identified correctly with TOF-SIMS. By combining the chemical information of TOF-SIMS with the dimensional information of SPM a true three-dimensional chemical image can be generated.
Surface profiler mode
The SPM module of the M6 Plus also allows for detailed analysis of large sputter craters. In the so-called surface profiler mode multiple SPM scans are stitched together to measure long SPM line scans. This unique SPM mode is extremely valuable to precisely determine the depth of sputter craters or to measure crater roughness on the nanometre scale.
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