Electron Beam Evaporators
Our range of e-beam evaporators are designed to evaporate low vapour pressure materials. The material is heated in a localised area by an electron beam produced from a filament biased relative to the rod of the desired material or to a crucible containing it. Our smaller sources are typically optimised for highly controlled deposition of very thin layers in the range of a monolayer or a few nm onto smaller flag-style samples. As the sources get larger, material capacity and possible sample size increases accordingly.
Key Features
- Depositon from rod or crucible
- UHV compatible
- Complete solution including control electronics
- Sources can optionally be placed in a retraction unit with differential pumping for loading of new material without venting
Please see the download arrows in the product table for data sheets with detailed information on each product.
To assist the choice of crucibles or rod please download our evaporation guide. Our alternative evaporation guide based on the periodic table includes information on the vapour pressure of the elements at different temperatures.
