AFM Workshop NP Nanoprofiling AFM
Unlike the some of the other AFM Workshop systems, the NP Atomic Force Microscopy (AFM) is designed from the ground up for measurement of larger samples as large as 200 mm X 200 mm X 20 mm or multiple smaller samples. Its configuration is best suited to nanoprofiling applications for analysis of surface roughness and topography of larger samples such as wafers or multiple samples. Two different stages are available for the system. It can either be supplied with a large holder for 6 separate standard AFM magnetic disks, or vacuum chuck for wafers and flat samples up to 8″. The 8″ wafer stage is allows the full 8″ wafer to be addressed by the AFM probe via a two-tier coarse and fine sample positioning system. The system is based on tip scanning rather than sample scanning in some other AFM Workshop systems.
Key Features
| High Resolution Video Microscope | Readily locate Features for Scanning |
| Multiple Sample Stage or Vacuum Chuck | Optimised for specific technical samples |
| Closed Loop XY scanner | Great accuracy with rapid zoom to feature |
| Probe Exchange Tool | Reduce time for probe exchange |
| In plane flexure XY scanner | Minimal out of plane motion in images |
| Labview software with USB communication | Readily adaptable to new operating systems |
| Uses Industry standard probes | Probes for specific measurements are readily available. |
| Includes Vibrating, Non-Vibrating modes | Turn-key system |
