ARPES and UPS Systems and Components

While XPS is typically focussed on the chemical structure of a material, UPS (Ultraviolet photoelectron Spectroscopy) and Angular resolved photoemission spectroscopy (ARPES) are focussed on the electronic structure of the material. Compared to XPS, the use of an ultraviolet light source restricts the energy of the photons such that only the valence band electrons of the material are probed.  In UPS and XPS the primary focus is the energy of the emitted electrons, while in ARPES the angular distribution of the emitted electrons is measured in addition to their energy. The emission angle of the electrons is determined by the in-plane momentum of the electron within the surface and can be used to obtain useful information about the electron band structure of the material. The valence band electrons in a material are important to determine the chemical reactivity and electrical properties of the material. With ARPES it is possible to directly determine the band structure of the occupied and unoccupied states.

With our partner, SPECS, we are able to offer ARPES systems with ultimate energy and angle resolution and with highly optimised system properties such as low residual magnetic field, ultralow sample temperature and sample geometry. We also offer a range of high intensity, small spot ultraviolet light sources available as separate components for existing UPS systems.

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ARPES and UPS Systems and Components

While XPS is typically focussed on the chemical structure of a material, UPS (Ultraviolet photoelectron Spectroscopy) and Angular resolved photoemission spectroscopy (ARPES) are focussed on the electronic structure of the material. Compared to XPS, the use of an ultraviolet light source restricts the energy of the photons such that only the valence band electrons of the material are probed.  In UPS and XPS the primary focus is the energy of the emitted electrons, while in ARPES the angular distribution of the emitted electrons is measured in addition to their energy. The emission angle of the electrons is determined by the in-plane momentum of the electron within the surface and can be used to obtain useful information about the electron band structure of the material. The valence band electrons in a material are important to determine the chemical reactivity and electrical properties of the material. With ARPES it is possible to directly determine the band structure of the occupied and unoccupied states.

With our partner, SPECS, we are able to offer ARPES systems with ultimate energy and angle resolution and with highly optimised system properties such as low residual magnetic field, ultralow sample temperature and sample geometry. We also offer a range of high intensity, small spot ultraviolet light sources available as separate components for existing UPS systems.

Key Features


Applications include band Mapping of:

• Semiconductors
• Metals
• Single layer / 2D materials e.g. Graphene.
• Transition metal dichalcogenides / oxides
• Topological materials
• Quantum well states

ARPES and UPS Systems and Components

While XPS is typically focussed on the chemical structure of a material, UPS (Ultraviolet photoelectron Spectroscopy) and Angular resolved photoemission spectroscopy (ARPES) are focussed on the electronic structure of the material. Compared to XPS, the use of an ultraviolet light source restricts the energy of the photons such that only the valence band electrons of the material are probed.  In UPS and XPS the primary focus is the energy of the emitted electrons, while in ARPES the angular distribution of the emitted electrons is measured in addition to their energy. The emission angle of the electrons is determined by the in-plane momentum of the electron within the surface and can be used to obtain useful information about the electron band structure of the material. The valence band electrons in a material are important to determine the chemical reactivity and electrical properties of the material. With ARPES it is possible to directly determine the band structure of the occupied and unoccupied states.

With our partner, SPECS, we are able to offer ARPES systems with ultimate energy and angle resolution and with highly optimised system properties such as low residual magnetic field, ultralow sample temperature and sample geometry. We also offer a range of high intensity, small spot ultraviolet light sources available as separate components for existing UPS systems.

Key Features


Applications include band Mapping of:

• Semiconductors
• Metals
• Single layer / 2D materials e.g. Graphene.
• Transition metal dichalcogenides / oxides
• Topological materials
• Quantum well states

The ProvenX-ARPES system is a dedicated small spot ARPES analysis tool, supporting the new ASTRAIOS 190 electron analyser with single spot shifting lens, parallel single event detectors and optional 3D spin detection, as well as the UVS µFOCAL small spot UV source with optional monochromator. The sample handling is done by the SPECS Ganymed low temperature manipulator series. The system comes with a dedicated preparation chamber, a clean UHV sample storage facility and a multi sample fast entry loadlock.

System control is done by the SpecsLab Prodigy software suite with integrated remote control packages, automated sample handling and a computer based vacuum control system.

The system can be equipped with an optional small spot x-ray source for material characterization, electron sources and charge neutralization sources. Additional software and preparation tools are available.

The ProvenX-MM system is a specialized system base for momentum microscopy solutions, supporting the KREIOS 150 Series, parallel single event detectors and optional spin detection, as well as the UVS µFOCAL small spot UV source with optional monochromator. The sample handling is done by the SPECS HESTIA low temperature microscopy stage. The system comes with a dedicated preparation chamber, a clean UHV sample storage facility and a multi sample fast entry loadlock.

System control is done by the SpecsLab Prodigy software suite with integrated remote control packages, automated sample handling and a computer based vacuum control system.

The system can be equipped with an optional small spot x-ray source for material characterisation. Additional software and preparation tools are available.

The ASTRAIOS 190 is a revolutionary ARPES analyser for 2D momentum mapping. It is based on a direct k-mapping single spot shifting lens with a virtual entrance slit for ultimate k- and energy resolved measurements.

 

The KREIOS 150 S is a new generation of electron spectrometers for high performance ARPES and PEEM. The unique lens system combines an immersion lens for PEEM operation with a hemispherical energy analyser scanning system for unrivaled ARPES measurements. Its lens system acquires the full half sphere of the electron emission for ultimate angular acceptance of 180°.

The KREIOS 150 S displays energy vs k-vector or energy vs spatial information directly on the detector. With the scanning lens it is possible to measure a full 3D dataset for ARPES or energy filtered PEEM. The lens system features apertures to refine the k-space into high contrast and dark field PEEM, as well as field apertures to select a spatial region for µ-ARPES down to 2 µm field of view. The kinetic energy up to 1500 eV allows XPS and XPEEM measurements. With the new CMOS detector, the KREIOS 150 S is the most performing ARPES analyser available.

The KREIOS 150 MM is a new generation of electron spectrometers for high performance ARPES and PEEM. The unique lens systems combines and immersion lens for PEEM operation with a hemispherical energy analyser scanning system for unrivaled ARPES measurements. Its lens system acquired the fill half sphere of the electron emission for ultimate angular acceptance of 180°.

The KREIOS 150 MM comes with a special lens system for momentum microscopy, showing a constant energy map or a real space map on the detector. Integrated deflectors allow changing the microscopy spot without moving the sample. The lens system features apertures to refine the k-space into high contrast and dark field PEEM, as well as field apertures to select a spatial region for µ-ARPES down to 2 µm field of view. The kinetic energy up to 1500 eV allows XPS and XPEEM measurements. With the new CMOS detector the KREIOS 150 is the most performing ARPES analyser available. Due to the design of the KREIOS lens system and hemisphere, no artificial aberration correction is needed. Instead a second hemisphere can be upgraded to enhance the energy resolution or the electron transmission.

The METIS 1000 is the next generation TOF spectrometer for ARPES and momentum microscopy. If a pulsed light source is available, the METIS 1000 is the intrument of choice. It allows aquisition of two in plane k-vectors against the kinetic electron energy in one shot. The lens system is optimised for high momentum resolution and acquired electrons from the complete half space above the sample, yielding ultimate acceptance angles. The lens design directly shows the k-space on the detector, hence, no conversion from angular space into real space is needed. Integrated deflectors in the microscopy lens allow to move the area of interest without moving the sample and integrated apertures can be used for µ-ARPES or contracst enhancement in PEEM. The native repetition rate of the detector is 5-8 MHz. With a special frequency splitter is is possible to boost the acceptable repetition rate up to 100 MHz.

The µSIRIUS is a new generation of duo-plasmatron based discharge light sources. Its body fully manufactured by additive manufacturing increases the stability and performance compared to the existing UV light sources. The imprinted water cooling reduces the dimensions of the source and allows us to improve the anode geometry. The photon flux density can be increased by an order of magnitude compared to the existing solutions. A new type of filament comes with a significantly increased life time of > 5000 hours.

The µFOCAL capillary is a true focusing capillary. Due to the duo-plasmatron principle, the UV source generates a tiny emission spot, which can be focused on the surface without any artificial apertures. The new capillary design reduces the spot size down to 100 µm with no loss in the photon flux. Hence the flux density on the sample surface can be increased by one order of magnitude.

The TMM 304 is a high flux VUV monochromator optimised for use with the µSIRIUS UV source. It features exchangeable gratings for various emission lines such as He I, He II or Xe. The design of the VUV monochromator produces light with a high intrinsic degree of linear polarized light. A rotatable frame allows a change from s to p polarization without breaking the vacuum. An optional polariser cassette is available to increase the degree of polarisation. The efficient pumping system results in extremely low operational pressures in the analysis system

The SPECS UVS 10/35 is an easy to use and robust UV source. It provides an excellent He I to He II ratio and can be operated with many different gases. The source is designed for longest operation time with extreme stability and easy ignition.

The UV source fits almost any vacuum chamber on a free DN40CF flange, while the sample to flange distance is not critical. An optional polariser is available to polarise the normally unpolarised light.

For many years, the Phoibos-series analysers have formed the cornerstone of the SPECS analyser product range and as such are well proven in the field. Depending on configuration, the Phoibos series can be adapted for XPS, UPS, ARPES, HAXPES, NAP XPS or ISS. It comes in three possible hemisphere sizes: 100, 150 and 225mm and a range of 1D and 2D detectors including 1D and 2D delayline, 2D-CCD and AD-CMOS. Acceptance angles of +/-15º are standard.