Semiconductor

Vacuum and surface analytical techniques are critical in semiconductor manufacturing, enabling precise control over material properties at the micro- and nanoscale. These methods support process optimisation, contamination analysis, and failure diagnostics throughout the device lifecycle. By combining chemical, structural, and electrical insights, they play a key role in advancing semiconductor technology.

In the semiconductor industry, advanced vacuum and surface-analytical techniques are essential for characterising materials at the micro- and nanoscale. These methods enable detailed insight into the composition, structure, and electrical behavior of semiconductor devices, which is critical during manufacturing, quality control, and failure analysis. Techniques such as X-ray Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES), and Ultraviolet Photoelectron Spectroscopy (UPS), often performed under ultra-high vacuum (UHV) conditions, are widely used to analyse surfaces, thin films, and interfaces in semiconductor components. These analyses help in optimising layer deposition processes, verifying doping profiles, and detecting unwanted contaminants that may impact device performance.

Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and Low Energy Ion Scattering (LEIS) provide complementary insights into the elemental and molecular makeup of surfaces and interfaces with extreme sensitivity and depth resolution. Additionally, advanced nanoprobing tools such as Electron Beam Induced Current (EBIC), Electron Beam Absorbed Current (EBAC), and Scanning Probe Microscopy (SPM) enable failure localisation and electrical characterisation at the transistor and interconnect level. These techniques are crucial for diagnosing performance issues in densely packed integrated circuits. Collectively, these surface-sensitive methods ensure that semiconductor fabrication remains precise, reliable, and aligned with the rapidly evolving demands of modern electronics.

Relevant products

Imina Robot Nano (miBotâ„¢)

Imina’s Nano robots are the most important components of their probing and manipulation solutions, designed for customers who wish to use them in an SEM environment. They are extremely compact mobile cubes of just over 2x2cm horizontally, and with a low height of just 12.5mm above the stage they are compatible even with short working SEMs. They are fully mobile actuators with the freedom to move at different speeds over the stage on which they sit in X, Y and rotation. Additionally the probe arm is able to move independently in Z. There are two different versions of the Nano robot with different scanning range in the Z axis. The longer travel version facilitates easier approach of the probe to fragile samples and easier switching between different areas of the sample.

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IONTOF M6 TOF-SIMS

The M6 is the latest generation of high-end TOF-SIMS instruments developed by IONTOF. Its design guarantees superior performance in all fields of SIMS applications. Ground-breaking ion beam and mass analyser technologies make the M6 the benchmark in SIMS instrumentation and the ideal tool for industrial and academic research. The instrument includes:

M6 TOF Analyser: The revolutionary design of the extraction optics, the ion transfer and detection system provides an unmatched level of mass resolution, mass accuracy and transmission.

Nanoprobe 50: The Nanoprobe 50 is the latest generation bismuth cluster ion source for the M6. It provides highest beam currents and ultimate lateral resolutions down to 50 nm, guaranteed.

 

 

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EnviroMETROS

EnviroMETROS is a unique metrology platform for the chemical analysis of ultrathin films and 2D materials that allows a detailed characterisation of stoichiometries‚ composition and depth distribution of elements. The system combines XPS with an array of optional techniques such as HAXPES, UPS, IPES, AES, REELS, Raman and Infrared spectroscopies. These techniques can be employed on the same sample spot. It can optionally be configured for NAP XPS, but the base model is a UHV load-locked system. Depending on the system configuration, it can be set up for 80x80mm samples or 8″ or 12″ wafers.

 

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AFM Workshop NP Nanoprofiling AFM

Unlike the some of the other AFM Workshop systems, the NP Atomic Force Microscopy (AFM) is designed from the ground up for measurement of larger samples as large as 200 mm X 200 mm X 20 mm or multiple smaller samples. Its configuration is best suited to nanoprofiling applications for analysis of surface roughness and topography of larger samples such as wafers or multiple samples. Two different stages are available for the system. It can either be supplied with a large holder for 6 separate standard AFM magnetic disks, or vacuum chuck for wafers and flat samples up to 8″. The 8″ wafer stage is allows the full 8″ wafer to be addressed by the AFM probe via a two-tier coarse and fine sample positioning system. The system is based on tip scanning rather than sample scanning in some other AFM Workshop systems.

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Mini MBE System

The CreaTec MiniMBE System is specially designed for Molecular Beam Epitaxy growth on small, typically flag style, samples in combination with a reduced size of the system compared to typical MBE systems. The system still has space to accommodate up to 11 effusion cells around a larger central port for a plasma source or e-beam evaporator. The small chamber size compared to typical MBE systems has advantages for ease of integration with other systems, less lab floor space and of course lower running costs.

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AtomTrace Sci-Trace

The AtomTrace SciTrace is a modular instrument designed from the ground up for high quality Laser Induced Breakdown Spectroscopy (LIBS) Measurements. The instrument can either be configured as a vacuum-based instrument, or as a simple open “cage” chamber where the sample is measured under ambient conditions. The vacuum body provides protection against laser reflections and potentially toxic ablated materials. All windows are covered with laser filters. The system can easily be configured to house multiple lasers all pointing at the sample target for multiple / double pulsed LIBS in order to enhance the detection limits.

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EnviroESCA

This novel and smart analysis tool overcomes the barriers of standard XPS systems by enabling analyses at pressures far above UHV. EnviroESCA is designed from the ground up for high-throughput analysis and opens up new applications in the fields of medical technology, biotechnology and the life sciences.

It offers the shortest loading-to-measurement time on samples of all types including liquids, tissue, plastics and foils, powders, soil, zeolites, rocks, minerals and ceramics

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Qtac Low Energy Ion Scattering (LEIS) System

The Qtac is a high sensitivity Low Energy Ion Scattering (LEIS) instrument. It is extremely surface-sensitive, providing quantitative elemental characterisation of the top atomic layer.

This instrument has been developed to include small spot analysis, surface imaging, and both static and dynamic depth profiling.

Its unique surface sensitivity makes the Qtac the perfect tool to study surface processes. The Qtac provides valuable information in many production and research areas on materials such as catalysts, semiconductors, metals, polymers, and fuel cells.

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µFOCUS 450

This small spot source is equipped with Al anode in the standard configuration and two upgradable higher energies anodes (Ag, and Cr) for HAXPES capabilities. The µFOCUS 450 monochromator together with the XR-MC micro-focus X-ray source is perfectly suited for small spot, high resolution, and high intensity XPS measurements. The X-ray monochromator operates according to Bragg’s Law of X-ray diffraction. Each wavelength of X-rays (Al Kα, Ag Lα, Cr Kα) is reflected from individually optimized crystals at a specific angle of reflection. For the Al and Ag anodes, quartz crystal are used, which have a 450 mm and 416 mm Rowland circle diameter respectively , whereas for Cr germanium crystals are used with a 676 mm Rowland circle. Due to its overall compactness, the µFOCUS 450 is suitable for mounting on almost any analysis chambers as a bolt-on component. Furthermore, being already equipped with a Si3N4 window, by using the differentially pumped NAP extension, the µFOCUS 450 allows to carry out XPS measurements under gas atmospheres of up to 50 mbar.

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